On the doping mechanism of boron-doped hydrogenated amorphous silicon deposited by rf-co-sputtering

  1. De Lima Jr., M.M.
  2. Marques, F.C.
Journal:
Journal of Non-Crystalline Solids

ISSN: 0022-3093

Year of publication: 2002

Volume: 299-302

Issue: PART 1

Pages: 605-609

Type: Conference paper

DOI: 10.1016/S0022-3093(01)01205-4 GOOGLE SCHOLAR
Data source: Scopus