Focused electron beam induced etching of titanium with XeF2

  1. Schoenaker, F.J.
  2. Córdoba, R.
  3. Fernndez-Pacheco, R.
  4. Magén, C.
  5. Stéphan, O.
  6. Zuriaga-Monroy, C.
  7. Ibarra, M.R.
  8. De Teresa, J.M.
Revue:
Nanotechnology

ISSN: 0957-4484 1361-6528

Année de publication: 2011

Volumen: 22

Número: 26

Type: Article

DOI: 10.1088/0957-4484/22/26/265304 GOOGLE SCHOLAR

Objectifs de Développement Durable