Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions

  1. De Teresa, J.M.
  2. Orús, P.
  3. Córdoba, R.
  4. Philipp, P.
Revue:
Micromachines

ISSN: 2072-666X

Année de publication: 2019

Volumen: 10

Número: 12

Type: Révision

DOI: 10.3390/MI10120799 GOOGLE SCHOLAR lock_openAccès ouvert editor
La source de données: Scopus