Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions

  1. De Teresa, J.M.
  2. Orús, P.
  3. Córdoba, R.
  4. Philipp, P.
Aldizkaria:
Micromachines

ISSN: 2072-666X

Argitalpen urtea: 2019

Alea: 10

Zenbakia: 12

Mota: Berrikuspena

DOI: 10.3390/MI10120799 GOOGLE SCHOLAR lock_openSarbide irekia editor
Datuen iturria: Scopus