Au-pva nanocomposite negative resist for one-step three-dimensional e-beam lithography

  1. Marqués-Hueso, J.
  2. Abargues, R.
  3. Canet-Ferrer, J.
  4. Agouram, S.
  5. Valdés, J.L.
  6. Martínez-Pastor, J.P.
Revue:
Langmuir

ISSN: 0743-7463 1520-5827

Année de publication: 2010

Volumen: 26

Número: 4

Pages: 2825-2830

Type: Article

DOI: 10.1021/LA902915N GOOGLE SCHOLAR

Objectifs de Développement Durable