Boron doping of hydrogenated amorphous silicon prepared by rf-co-sputtering

  1. De Lima Jr., M.M.
  2. Freire Jr., F.L.
  3. Marques, F.C.
Journal:
Brazilian Journal of Physics

ISSN: 0103-9733

Year of publication: 2002

Volume: 32

Issue: 2 A

Pages: 379-382

Type: Conference paper

DOI: 10.1590/S0103-97332002000200037 GOOGLE SCHOLAR lock_openOpen access editor
Data source: Scopus