Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition
- Oliveira Jr., M.H.
- Viana, G.A.
- De Lima Jr., M.M.
- Cros, A.
- Cantarero, A.
- Marques, F.C.
Aldizkaria:
Journal of Applied Physics
ISSN: 0021-8979
Argitalpen urtea: 2010
Alea: 108
Zenbakia: 12
Mota: Artikulua