Properties of al2o3 thin films grown by pe-ald at low temperature using h2o and o2 plasma oxidants

  1. Castillo-Saenz, J.
  2. Nedev, N.
  3. Valdez-Salas, B.
  4. Curiel-Alvarez, M.
  5. Mendivil-Palma, M.I.
  6. Hernandez-Como, N.
  7. Martinez-Puente, M.
  8. Mateos, D.
  9. Perez-Landeros, O.
  10. Martinez-Guerra, E.
Aldizkaria:
Coatings

ISSN: 2079-6412

Argitalpen urtea: 2021

Alea: 11

Zenbakia: 10

Mota: Artikulua

DOI: 10.3390/COATINGS11101266 GOOGLE SCHOLAR lock_openSarbide irekia editor
Datuen iturria: Scopus