Properties of al2o3 thin films grown by pe-ald at low temperature using h2o and o2 plasma oxidants
- Castillo-Saenz, J.
- Nedev, N.
- Valdez-Salas, B.
- Curiel-Alvarez, M.
- Mendivil-Palma, M.I.
- Hernandez-Como, N.
- Martinez-Puente, M.
- Mateos, D.
- Perez-Landeros, O.
- Martinez-Guerra, E.
Zeitschrift:
Coatings
ISSN: 2079-6412
Datum der Publikation: 2021
Ausgabe: 11
Nummer: 10
Art: Artikel