Bias-stress instabilities in low-temperature thin-film transistors made of Al2O3 and ZnO films deposited by PEALD

1. Castillo-Saenz, J.R.
2. Nedev, N.
3. Martinez-Guerra, E.
4. Valdez-Salas, B.
5. Mendivil-Palma, M.I.
6. Curiel-Alvarez, M.A.
7. Aleman, M.
8. Lopez-Castillo, M.
9. Hernández-López, J.L.
10. Toledo-Guizar, P.G.
11. Hernández-Como, N.