Structural and electronic properties of polycrystalline inas thin films deposited on silicon dioxide and glass at temperatures below 500◦c

1. Curran, A.
2. Gocalinska, A.
3. Pescaglini, A.
4. Secco, E.
5. Mura, E.
6. Thomas, K.
7. Nagle, R.E.
8. Sheehan, B.
9. Povey, I.M.
10. Pelucchi, E.
11. O’dwyer, C.
12. Hurley, P.K.
13. Gity, F.

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DOI: 10.3390/CRYST11020160 GOOGLE SCHOLAR lock_openOpen access editor

Data source: Scopus