Erratum: Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions [Micromachines, 10, (2019) 799] DOI: 10.3390/mi10120799
- De Teresa, J.M.
- Orús, P.
- Córdoba, R.
- Philipp, P.
Aldizkaria:
Micromachines
ISSN: 2072-666X
Argitalpen urtea: 2020
Alea: 11
Zenbakia: 2
Mota: Hutsen zuzenketa
