Erratum: Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions [Micromachines, 10, (2019) 799] DOI: 10.3390/mi10120799

  1. De Teresa, J.M.
  2. Orús, P.
  3. Córdoba, R.
  4. Philipp, P.
Revista:
Micromachines

ISSN: 2072-666X

Any de publicació: 2020

Volum: 11

Número: 2

Tipus: Errata

DOI: 10.3390/MI11020211 GOOGLE SCHOLAR lock_openAccés obert editor
Font de les dades: Scopus