Recubrimientos decorativos de Ti, TiN y TiO2, sobre vidrio, depositados en vacío mediante pulverización por arco eléctrico

  1. Sánchez Bolinches, Alejandro 2
  2. Cantarero, Andrés 1
  3. Vershinin, N. 3
  4. Straumal, B. B. 3
  5. Rabkin, E. 4
  1. 1 Universitat de València
    info

    Universitat de València

    Valencia, España

    ROR https://ror.org/043nxc105

  2. 2 Universidad Politécnica de Valencia
    info

    Universidad Politécnica de Valencia

    Valencia, España

    ROR https://ror.org/01460j859

  3. 3 Institute for Vacuum Technology
  4. 4 Technion – Israel Institute of Technology
    info

    Technion – Israel Institute of Technology

    Haifa, Israel

    ROR https://ror.org/03qryx823

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Journal:
Boletín de la Sociedad Española de Cerámica y Vidrio

ISSN: 0366-3175

Year of publication: 2001

Volume: 40

Issue: 2

Pages: 138-143

Type: Article

DOI: 10.3989/CYV.2001.V40.I2.755 DIALNET GOOGLE SCHOLAR lock_openOpen access editor

More publications in: Boletín de la Sociedad Española de Cerámica y Vidrio

Abstract

In a vacuum arc discharge, highly ionised species are formed, which permits an effective control of the deposition process and, particularly, to deposit Ti, TiN and TiO2 coatings on non-conducting materials like glass. Moreover, this technique allows us to position a mask between the substrates and the sheets to be coated. Another advantage of the vacuum arc technology is the low substrate temperature during the deposition. Data on the roughness, composition and corrosion resistance in architectural glass mask-coated with titanium nitride and oxide are presented and analysed in this work. A comparative analysis is made with reactive direct current sputtering and plasma enhanced chemical vapour deposition techniques.

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Funding information

El trabajo presente gozó de apoyo financiero del programa Isopress-Inter Programm del Ministerio de Ciencia y de Tecnología de Rusia, Copernicus Network (contrato ERB IC15 CT98 0812), Generalitat Valenciana y de la Universidad de Valencia.

Funders

  • Ministerio de Ciencia y de Tecnología Russia
    • ERB IC15 CT98 0812
Data source: Dialnet