Next generation low temperature polycrystalline materials for above IC electronics. High mobility n- And p-type III–V metalorganic vapour phase epitaxy thin films on amorphous substrates

1. Gocalinska, A.
2. Pescaglini, A.
3. Secco, E.
4. Mura, E.E.
5. Thomas, K.
6. Curran, A.
7. Gity, F.
8. Nagle, R.
9. Schmidt, M.
10. Michałowski, P.P.
11. Hurley, P.K.
12. Povey, I.
13. Pelucchi, E.

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DOI: 10.1088/2515-7647/AB7557 GOOGLE SCHOLAR lock_openOpen access editor

Data source: Scopus