Use of Supramolecular Assemblies as Lithographic Resists

  1. Lewis, S.M.
  2. Fernandez, A.
  3. DeRose, G.A.
  4. Hunt, M.S.
  5. Whitehead, G.F.S.
  6. Lagzda, A.
  7. Alty, H.R.
  8. Ferrando-Soria, J.
  9. Varey, S.
  10. Kostopoulos, A.K.
  11. Schedin, F.
  12. Muryn, C.A.
  13. Timco, G.A.
  14. Scherer, A.
  15. Yeates, S.G.
  16. Winpenny, R.E.P.
Revue:
Angewandte Chemie - International Edition

ISSN: 1521-3773 1433-7851

Année de publication: 2017

Volumen: 56

Número: 24

Pages: 6749-6752

Type: Article

DOI: 10.1002/ANIE.201700224 GOOGLE SCHOLAR