Deposition of a-Si:H thin films using tailored voltage waveform plasmas: impact on microstructure and stability

  1. Wang, J.
  2. Longeaud, C.
  3. Ventosinos, F.
  4. Daineka, D.
  5. Yaakoubi, M.E.
  6. Johnson, E.V.
Journal:
Physica Status Solidi (C) Current Topics in Solid State Physics

ISSN: 1610-1642 1862-6351

Year of publication: 2016

Volume: 13

Issue: 10-12

Pages: 735-739

Type: Article

DOI: 10.1002/PSSC.201600024 GOOGLE SCHOLAR

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