Deposition of a-Si:H thin films using tailored voltage waveform plasmas: impact on microstructure and stability
- Wang, J.
- Longeaud, C.
- Ventosinos, F.
- Daineka, D.
- Yaakoubi, M.E.
- Johnson, E.V.
ISSN: 1610-1642, 1862-6351
Year of publication: 2016
Volume: 13
Issue: 10-12
Pages: 735-739
Type: Article